Collection search - Quebec, contoured plan of ground round No. 3 tower on the Plains of Abraham. J. Simmons, Lt. Rol engrs, 29th Nov. 1842. P. Cole, Major, Dist. Royl Engr, 29th Nov. 1842. R.I. Pilkington, Draftsman. Examined S. Westmacott, Lt. and Actg adjt R.E. J. Oldfield, Col., Staff, Comg Royal Engineer in Canada. Dec. 21st 1842. [cartographic material]
-
Hierarchy Quebec, contoured plan of ground round No. 3 tower on the Plains of Abraham. J. Simmons, Lt. Rol engrs, 29th Nov. 1842. P. Cole, Major, Dist. Royl Engr, 29th Nov. 1842. R.I. Pilkington, Draftsman. Examined S. Westmacott, Lt. and Actg adjt R.E. J. Oldfield, Col., Staff, Comg Royal Engineer in Canada. Dec. 21st 1842. [cartographic material]
Hierarchical level:ItemContext of this record: -
Record information Quebec, contoured plan of ground round No. 3 tower on the Plains of Abraham. J. Simmons, Lt. Rol engrs, 29th Nov. 1842. P. Cole, Major, Dist. Royl Engr, 29th Nov. 1842. R.I. Pilkington, Draftsman. Examined S. Westmacott, Lt. and Actg adjt R.E. J. Oldfield, Col., Staff, Comg Royal Engineer in Canada. Dec. 21st 1842. [cartographic material]
Date:1842Reference:Local class no.: H2/340/Quebec/1842, Box number: 2000213131Local class no.:H2/340/Quebec/1842Type of material:Maps and cartographic materialFound in:Archives / Collections and FondsItem ID number:4128391Date(s):1842Place:S.l.:Place of creation:CanadaPublisher:s.n.,Extent:1 map : Manuscript ; 35 1/2 x 32 1/2.Language of material:EnglishAdditional name(s):Additional information:Availability of other formats note:The microfiche version is NMC20639Varying form of title:Source:Private -
Ordering and viewing options Conditions of access:Cartographic material[ConsultationOpen]Microfiche NMC20639[ConsultationOpen]Box [340 QUEBEC 1842] 2000213131[ConsultationOpen]Terms of use:Copyright: Expired = Domaine publicYou can order materials in advance to be ready for you when you visit. You will need a user card to do this.
Cannot visit us on site? You can purchase a copy to be sent to you. Some restrictions may apply.